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Materials Chemistry

Working Paper

Chemical vapor deposition of sp2-boron nitride films on Al2O3 (0001), (11𝟐0), (1𝟏02) and (10𝟏0) substrates

Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg

Version 1 posted 07 December 2021

199

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Materials Science

Working Paper

Area Selective Deposition of Iron Films Using Temperature Sensitive Masking Materials and Plasma Electrons as Reducing Agents

Hama Nadhom, Yusheng Yuan, Polla Rouf, Niclas Solin, Henrik Pedersen

Version 2 posted 11 May 2021

483

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Inorganic Chemistry

Working Paper

Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum

Polla Rouf, Pitsiri Sukkaew, Lars Ojamäe, Henrik Pedersen

Version 2 posted 11 May 2020

593

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Theoretical and Computational Chemistry

Working Paper

Kinetic Monte Carlo Modeling of Graphene Sheet Growth During CVD

Hironori Kondo

Version 1 posted 06 January 2022

346

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Physical Chemistry

Working Paper

Biased quartz crystal microbalance method for studies of CVD surface chemistry induced by plasma electrons

Pentti Niiranen, Hama Nadhom, Michal Zanaska, Robert Boyd, Mauricio Sortica, Daniel Primetzhofer, Daniel Lundin, Henrik Pedersen

Version 1 posted 25 August 2022

153

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Materials Science

Working Paper

Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(𝟎𝟎𝟎𝟏̅) and 4H-SiC(0001) substrates by chemical vapor deposition

Laurent Souqui, Sachin Sharma, Hans Högberg, Henrik Pedersen

Version 1 posted 04 July 2022

146

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Materials Science

Working Paper

Controlled CVD growth of highly <111>-oriented 3C-SiC

Jing-Jia Huang, Christian Militzer, Charles Wijayawardhana, Urban Forsberg, Lars Ojamäe, Henrik Pedersen

Version 1 posted 23 February 2022

295

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Materials Science

Working Paper

Conformal and superconformal chemical vapor deposition of silicon carbide coatings

Jing-Jia Huang, Christian Militzer, Charles Wijayawardhana, Urban Forsberg, Henrik Pedersen

Version 1 posted 12 May 2022

201

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Materials Science

Working Paper

Chemical Vapor Deposition of Sp2-Boron Nitride on Si(111) Substrates from Triethylboron and Ammonia: Effect of Surface Treatments

Laurent Souqui, Henrik Pedersen, Hans Högberg

Version 1 posted 24 January 2020

500

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Materials Science

Working Paper

Isothermal growth and stacking evolution in highly uniform AB-stacked bilayer graphene

Pablo Solís-Fernández, Yuri Terao, Kenji Kawahara, Kosuke Nagashio, Yung-Chang Lin, Keisuke Yamamoto, Hiroshi Nakashima, Hiroki Hibino, Kazu Suenaga, Hiroki Ago

Version 1 posted 31 December 2019

511

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26 results in CVD in Keywords: CVD

Chemical vapor deposition of sp2-boron nitride films on Al2O3 (0001), (11𝟐0), (1𝟏02) and (10𝟏0) substrates

Area Selective Deposition of Iron Films Using Temperature Sensitive Masking Materials and Plasma Electrons as Reducing Agents

Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum

Kinetic Monte Carlo Modeling of Graphene Sheet Growth During CVD

Biased quartz crystal microbalance method for studies of CVD surface chemistry induced by plasma electrons

Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(𝟎𝟎𝟎𝟏̅) and 4H-SiC(0001) substrates by chemical vapor deposition

Controlled CVD growth of highly <111>-oriented 3C-SiC

Conformal and superconformal chemical vapor deposition of silicon carbide coatings

Chemical Vapor Deposition of Sp2-Boron Nitride on Si(111) Substrates from Triethylboron and Ammonia: Effect of Surface Treatments

Isothermal growth and stacking evolution in highly uniform AB-stacked bilayer graphene

26 results in Keywords: CVD