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Materials Chemistry

Working Paper

Self-limiting Nitrogen/Hydrogen Plasma Radical Chemistry in Plasma-Enhanced Atomic Layer Deposition of Cobalt

Ji Liu, Hongliang Lu, David Wei Zhang, Michael Nolan

Version 1 posted 20 August 2021

389

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Materials Chemistry

Working Paper

Incorporation of Tungsten or Cobalt into TaN Barrier Layers Controls Morphology of Deposited Copper

Cara-Lena Nies, Michael Nolan

Version 1 posted 08 March 2023

112

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Materials Chemistry

Working Paper

Thermal atomic layer deposition of In2O3 thin films using a homoleptic indium triazenide precursor and water

Pamburayi Mpofu, Polla Rouf, Nathan O'Brien, Urban Forsberg, Henrik Pedersen

Version 2 posted 09 February 2022

549

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Inorganic Chemistry

Working Paper

Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum

Polla Rouf, Pitsiri Sukkaew, Lars Ojamäe, Henrik Pedersen

Version 2 posted 11 May 2020

593

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Materials Science

Working Paper

Atomic Layer Deposition of CeOx Nanoclusters on TiO2

Ji Liu, Saeed Saedy, Rakshita Verma, J. Ruud van Ommen, Michael Nolan

Version 1 posted 19 May 2020

622

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Materials Science

Working Paper

Reactions of Ruthenium Cyclopentadienyl Praecursor in the Metal Precursor Pulse of Ru Atomic Layer Deposition

Ji Liu, hongliang lu, david wei zhang, Michael Nolan

Version 1 posted 10 September 2020

764

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Inorganic Chemistry

Working Paper

Ligand Assisted Volatilization and Thermal Stability of [(t-BuN=)2MoCl2]2

Michael Land, Katherine Roberston, Sean Barry

Version 1 posted 09 August 2019

1,025

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Energy

Working Paper

PbI2 nanocrystal growth by atomic layer deposition of Pb(tmhd)2 and HI

Juan-Pablo Correa-Baena, Jacob Vagott, Kathryn Bairley, Carlo Andrea Riccardo Perini, Andres Felipe Castro Mendez, Juanita Hidalgo, Sarah Lombardo, Josh Kacher, Barry Lai

Version 1 posted 18 January 2022

273

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Materials Science

Working Paper

Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facet

Ji Liu, hongliang lu, david wei zhang, Michael Nolan

Version 2 posted 07 April 2020

1,144

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Inorganic Chemistry

Working Paper

A Rare Low Spin Co(IV) Bis-Silyldiamide with High Thermal Stability: Exploring the Origin of an Unusual S = 1/2 Configuration

David Zanders, Goran Bačić, Dominique Leckie, Oluwadamilola Odegbesan, Jeremy M. Rawson, Jason Masuda, Anjana Devi, Sean Barry

Version 2 posted 27 January 2020

659

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31 results in ALD in Keywords: ALD

Self-limiting Nitrogen/Hydrogen Plasma Radical Chemistry in Plasma-Enhanced Atomic Layer Deposition of Cobalt

Incorporation of Tungsten or Cobalt into TaN Barrier Layers Controls Morphology of Deposited Copper

Thermal atomic layer deposition of In2O3 thin films using a homoleptic indium triazenide precursor and water

Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum

Atomic Layer Deposition of CeOx Nanoclusters on TiO2

Reactions of Ruthenium Cyclopentadienyl Praecursor in the Metal Precursor Pulse of Ru Atomic Layer Deposition

Ligand Assisted Volatilization and Thermal Stability of [(t-BuN=)2MoCl2]2

PbI2 nanocrystal growth by atomic layer deposition of Pb(tmhd)2 and HI

Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facet

A Rare Low Spin Co(IV) Bis-Silyldiamide with High Thermal Stability: Exploring the Origin of an Unusual S = 1/2 Configuration

31 results in Keywords: ALD