Conformal Chemical Vapor Deposition of B4C Thin Films onto Carbon Nanotubes

17 September 2024, Version 1
This content is a preprint and has not undergone peer review at the time of posting.

Abstract

The unique attributes of carbon nanotubes (CNTs) establish them as the preferred material for fabricating sophisticated membrane architectures. However, CNT membranes are also susceptible to degradation under harsh environmental conditions, necessitating protective measures to maintain their functionalities. This study presents deposition of boron carbide (B4C) thin films as protective coatings on CNT membranes using chemical vapor deposition. Electron microscopy shows that B4C films were uniformly deposited on the CNTs. Raman spectroscopy shows the preservation of the G and D bands, with a notable stability in the RBM bands, while XPS measurements show sp2 hybridized C−C bonds and an additional shoulder characteristic of the deposited B4C film. This suggests that the CVD process does not degrade the CNTs, but merely adds a layer of B4C to their outer surface. This deposition process also allows for precise control over the membrane’s pore size, offering the potential to fine-tune the properties of CNT membranes.

Keywords

CVD
CNT
nanotubes
thin films
boron carbide
membrane

Supplementary materials

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Supplementary information
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Matlab code for image analysis
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