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Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels

13 August 2020, Version 3
Working Paper
This content is a preprint and has not undergone peer review at the time of posting.

Abstract

ABSTRACT: Atomic layer deposition (ALD) raises global interest through its unparalleled conformality. This work describes new microscopic lateral high-aspect-ratio (LHAR) test structures for conformality analysis of ALD. The LHAR structures are made of silicon and consist of rectangular channels supported by pillars. Extreme aspect ratios even beyond 10 000:1 enable investigations where the adsorption front does not penetrate to the end of the channel, thus exposing the saturation profile for detailed analysis. We use the archetypical trimethylaluminum (TMA)-water ALD process to grow alumina as a test vehicle to demonstrate the applicability, repeatability and reproducibility of the saturation profile measurement and to provide a benchmark for future saturation profile studies. Through varying the TMA reaction and purge times, we obtained new information on the surface chemistry characteristics and the chemisorption kinetics of this widely studied ALD process. We propose new saturation profile related classifications and terminology.

Keywords

atomic layer deposition
conformality
saturation profile
aluminum oxide
trimethylaluminum
kinetics
sticking coefficient
lateral high aspect ratio

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Now Published

Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels [opens in a new tab]
Jihong Yim, Oili M. E. Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, Mikko Utriainen, Riikka L. Puurunen journal article
Physical Chemistry Chemical Physics , Volume 22, Issue 40
Online publication date: 2020

Version History

Aug 13, 2020 Version 3

Version Notes

Revised version to be submitted to journal, with the supporting information included as one file.

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The content is available under CC BY NC ND 4.0 [opens in a new tab]

DOI

10.26434/chemrxiv.12366623.v3
D O I: 10.26434/chemrxiv.12366623.v3 [opens in a new tab]

Funding

Academy of Finland COOLCAT consortium, decision no. 329978
Academy of Finland Finnish Centre of Excellence on Atomic Layer Deposition
Tekes (Business Finland) TUTL PillarHall
Aalto University starting grant

Author’s competing interest statement

R.L.P developed the concept of the microscopic LHAR conformality test and is the inventor of a related patent application. VTT has made PillarHall™ test structure prototypes available for purchase. M.U. is re-sponsible for PillarHall™ test structure sales and commercialization activities at VTT and is the founder of Chipmetrics Oy.

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