Category:
Chemical Engineering and Industrial Chemistry
,
Working Paper
, Title:
Saturation Profile Based Conformality Analysis for Atomic Layer Deposition: Aluminum Oxide in Lateral High-Aspect-Ratio Channels
, Authors:
Jihong Yim, Oili Ylivaara, Markku Ylilammi, Virpi Korpelainen, Eero Haimi, Emma Verkama, Mikko Utriainen, Riikka Puurunen
Version 4 posted 23 September 2020
1,378
Downloads