Category:
Materials Chemistry
,
Working Paper
, Title:
Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition
, Authors:
Kayley E Waltz, Xinpei Zhou, Xavier Krull, Somya Singh, Eric Mattson, Yurun Miao, Matt Hettermann, Travis Grodt, Qi Zhang, Honggu Im, Bernhard Lüttgenau, Lauren Doyle, Andrea Kraetz, Max Beutner, Scott B. Clendenning, D. Howard Fairbrother, Joseph T. Hupp, Patrick Naulleau, Lawrence Rooney, Oleg Kostko, Michael Tsapatsis
Version 1 posted 19 June 2025
9
Downloads