Category:
Materials Chemistry
,
Working Paper
, Title:
Synthesis of End-Cap Enabled Self-Immolative Photoresists for Extreme Ultraviolet Lithography
, Authors:
Jingyuan Deng, Sean Bailey, Ruiwen Ai, Anthony Delmonico, Gregory Denbeaux, Shaoyi Jiang, Christopher Ober
Version 1 posted 04 July 2022
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