Refined Atomic Layer Deposition in Metal-Organic Frameworks (AIM) for the Effective and Atom-Precise Introduction of Pt1-3 in Node-Accessible NU-1000

Through the elaboration of standard atomic layer deposition (ALD) recipes to fit the properties of complex, porous metal-organic framework (MOF) substrates, it was possible to synthesize refined Pt-AIM@NU-1000 materials and advance the understanding of ALD in MOFs (AIM). It is generally understood that the post-synthetic functionalization of MOFs via the gas phase proves to be advantageous in comparison to its alternatives, like wet synthesis (e.g., impregnation) by an improved uniform metal dispersion or the elimination of time-consuming purification steps. These achievements can generally justify the use of the rather expensive and time-consuming ALD technique sufficiently, but simultaneously leave unfulfilled potential behind. By its nature, ALD promises the introduction of a high synthetic control which was now fully exploited to deposit Pt1-3 species in NU-1000 with exceptionally high loadings up to 28.4 wt. % Pt. This work lays the groundwork for further pushing the limits of AIM research.