Abstract
We present the design, fabrication, and application of robust metal/protein/metal junctions with ultrathin (~20 nm) protein films demonstrating long-term stability in ambient conditions and preserving their electron transport behavior also at ~10 K. These junctions establish a reliable platform with a permanent contact configuration, where the confined protein layer retains its functional activity after metal contact evaporation on the protein. A bottom-up micropore device (MpD) fabrication strategy was used and optimized to ensure reproducibility. The sub-nanometer roughness of the bottom electrode was preserved within the micropore, enabling uniform protein layer deposition and film formation. In the MpD structures, protein layers are integrated between Au-covered substrates and an e-beam evaporated Pd contacts. Depositing multi-layered protein films allows for defining film widths, as tested by the AFM-based scratching technique. The films were composed of human serum albumin (HSA) and bacteriorhodopsin (bR). Pd’s preferred two-dimensional growth minimized metal penetration and short circuits. Impedance phase response analysis shows that ~60% of the junctions are functional ones, demonstrating the effectiveness of the fabrication approach. These protein-based MpD junctions provide a stable platform for electron transport studies of bio- and other soft materials.
Supplementary materials
Title
Details of Device Fabrication Techniques with Supporting Figures
Description
The supplementary information details the experimental procedures and fabrication techniques used in the study. Section S1 describes the cryogenic setup and measurement methods. Section S2 focuses on sample preparation and the experimental setup for photo-cycle measurements, including a transmission-based UV-Vis setup (S2.1), the fabrication of a bR triple bilayer on glass (S2.2), the deposition of an ultra-thin Pd top contact (S2.3), and the photo-cycle measurement protocol (S2.4). Section S3 described PEM-IRRAS (photo-elastic modulated-infrared reflection-absorption spectroscopy) experimental details with the sample preparation (S3.1) and data collection parameters (S3.2). Sections S4 to S8 outline key nanofabrication processes: photolithography (S4), e-beam evaporation (S5), lift-off (S6), atomic layer deposition (ALD) (S7), and reactive ion etching (RIE) (S8). Together, these techniques enable the precise fabrication and characterization of the studied system.
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