Strain-Enabled Radical-Polar Crossover Annulation: A Unified Strategy to Access Spiro-, Fused-, and Enantioenriched-Aza/Oxa-Bicyclo[3.1.1]hepatanes

10 January 2025, Version 2
This content is a preprint and has not undergone peer review at the time of posting.

Abstract

Conformationally rigid bridged bicyclic scaffolds have emerged as bioisosteric replacements for planar aromatic rings. However, bioisosteric mimetics of heteroaromatic rings have been investigated less due to the challenges of incorporating heteroatoms into bicycloalkanes. Herein, we report a unified strategy to access both aza- and oxa-bicyclo [3.1.1]heptanes in a single experimental protocol from a readily accessible amino/hydroxy acid derivative under photoredox catalysis. The reaction exhibits a broad scope across a range of redox-active esters and bicyclo[1.1.0]butanes (BCBs) and successfully provides previously inaccessible spiro- and fused-hetero-bicyclo[3.1.1]heptanes. Noteworthy, chiral amino/hydroxy acids derived redox-active esters could be used to access enantioenriched hetero-bicyclo[3.1.1]heptanes. Furthermore, the strategy has been extended to access aza-bicyclo[2.1.1]hexanes, another important motif in medicinal chemistry. The functional groups introduced during the reaction serve as a synthetic handle for downstream manipulations, thus offering opportunities to build up molecular complexity rapidly. Density functional theory calculations and experimental studies support an oxidative radical-polar crossover mechanism and rationalize the observed regioselectivity.

Keywords

Radical-Polar Crossover Annulation
Aza/oxa-bicyclo[3.1.1]heptanes
Bicyclobutane
DFT studies
Ring-strain

Supplementary materials

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General information, experimental procedures, characterization data for all new compounds, NMR spectra, and coordinates of starting materials, intermediates, and transition states are in the Supplementary Information. Data for the crystal structure reported in this paper have been deposited at the Cambridge Crystallographic Data Centre (CCDC) under the deposition numbers CCDC 2386877 (for compound 3a) and CCDC 2409099 (for compound 3aac).
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