Abstract
The inherited insulating behavior of hexagonal boron nitride (h-BN) monolayer restricts its application in several optoelectronic devices, so finding a technique to reduce the bandgap allows it to possess
the semiconducting functionality. Here, an experimentally feasible fluorinated hexagonal boron
nitride (FBNF), a structurally, dynamically, and mechanically stable monolayer is reported by using
density functional theory calculations. The significant geometrical transformation from planer h-BN
to buckled FBNF softens the structure by retaining the mechanical isotropy and structural symmetry.
Remarkably, the induced direct bandgap semiconducting behavior after fluorination enhances the
optical absorbance and reflectivity reduces energy loss, creates strong optical anisotropy, and makes
FBNF monolayer is a proper material in the optoelectronic and nanomechanical applications