Low Temperature Platinum Chemical Vapor Deposition on Functionalized Self-Assembled Monolayers

10 February 2020, Version 1
This content is a preprint and has not undergone peer review at the time of posting.


The reaction pathways of Pt CVD using (COD)PtMe2-xClx (x = 0, 1, 2) have been investigated on functionalized self-assembled monolayers (SAMs) as models for organic substrates. In the presence of 1,4-cyclohexadiene, a well-known alkyl radical trap, Pt deposition was increased by up to 10-fold creating a room-temperature effective Pt CVD process.

This article has been submitted to the Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films.


chemical vapor deposition
Precursor chemistry
Pt deposition
self assembled monolayers


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