Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O2 as a Molecular Probe

23 October 2019, Version 1
This content is a preprint and has not undergone peer review at the time of posting.

Abstract

Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.

Keywords

perovskites quantum dots
Alumina ALD
protection layer

Supplementary materials

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