Abstract
Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.
Supplementary materials
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SI final
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