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Solvent-Free Powder Synthesis and Thin Film Chemical Vapour Deposition of a Zinc Bipyridyl-Triazolate Framework

30 September 2019, Version 1
Working Paper
This content is a preprint and has not undergone peer review at the time of posting.

Abstract

MAF-252, a non-porous crystalline coordination polymer, is obtained from the solvent-free reaction of ZnO with 3-(2-pyridyl)-5-(4-pyridyl)-1,2,4-triazole. MAF-252 can be synthesized in powder form and deposited as thin films, starting from ZnO powder and layers, respectively. Chemical vapour deposition (CVD) of MAF-252 enables conformal and patterned thin films, even on high aspect ratio features.

Keywords

Chemical Vapour Deposition (CVD)
Thin Films
Coordination Polymers
Solvent-free reactions

Supplementary materials

Title
Description
Actions
Title
190927 SI MAF252-CVD v7
Description
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Version History

Sep 30, 2019 Version 1

Version Notes

190928_MAF-252-CVD_V1

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The content is available under CC BY NC ND 4.0 [opens in a new tab]

DOI

10.26434/chemrxiv.9916622.v1
D O I: 10.26434/chemrxiv.9916622.v1 [opens in a new tab]

Funding

T.S., N.W. and I.S. thank the Research Foundation Flanders (FWO) for a SB-PhD fellowship (1S53316N and 1SB7919N) and for a postdoctoral fellowship (and 12L5417N). T.S. is grateful to Roland Resel and Sabina Rodríguez-Hermida for fruitful scientific discussions. R.A. acknowledges the funding from the European Research Council (No. 716472, acronym: VAPORE) and the Research Foundation Flanders (FWO) for funding in the research projects G083016N, G0E6319N and 1501618N and the infrastructure project G0H0716N. This study is a result from the lead project Porous Materials @ Work (Graz University of Technology, Austria). We acknowledge the Elettra Synchrotron Trieste for allocation of beamtime and thank Luisa Barba and Nicola Demitri for assistance in using beamline XRD1. Min Tu and Helge Reinsch are acknowledged for optimizing the ZnO patterning protocol and for attempting structure refinement, respectively.

Author’s competing interest statement

No conflict of interest

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