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Vapour-Phase Deposition of Oriented Copper Dicarboxylate Metal-Organic Framework Thin Films

submitted on 05.07.2019 and posted on 08.07.2019 by Timothée Stassin, Sabina Rodríguez-Hermida, Benedikt Schrode, Alexander John Cruz, Francesco Carraro, Dmitry Kravchenko, Vincent Creemers, Ivo Stassen, Tom Hauffman, Dirk De Vos, Paolo Falcaro, Roland Resel, Rob Ameloot
Copper dicarboxylate metal-organic framework films are deposited via chemical vapour deposition. Uniform films of CuBDC and CuCDC with an out-of-plane orientation and accessible porosity are obtained from the reaction of Cu and CuO with vaporised dicarboxylic acid linkers.


T.S. and I.S. thank the Research Foundation Flanders (FWO) for a SB-PhD fellowship and postdoctoral fellowship (1S53316N and 12L5417N). R.A. and P.F. acknowledge the funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreements n° 716472 and 771834, acronyms: VAPORE and POPCRYSTAL), and the Research Foundation Flanders (FWO) for funding in the projects G083016N, 1529618N and 1501618N. We acknowledge the European Synchrotron Radiation Facility for provision of synchrotron radiation facilities and we would like to thank Oleg Konovalov and Andrey Chumakov for assistance in using beamline ID10. The authors are grateful to Steven De Feyter for access to AFM instrumentation and to Max L. Tietze for XPS data processing.


Email Address of Submitting Author


KU Leuven



ORCID For Submitting Author


Declaration of Conflict of Interest

No conflict of interest

Version Notes

Version 1 - July 5th 2019