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Selective ALD on Pt clusters Gorey et al.pdf (635.25 kB)

Selective Growth of Al2O3 on Size-Selected Platinum Clusters by Atomic Layer Deposition

submitted on 15.08.2019, 00:03 and posted on 15.08.2019, 14:36 by Timothy J. Gorey, Yang Dai, Scott Anderson, Sungsik Lee, Sungwon Lee, Soenke Siefert, Randall Winans
In heterogeneous catalysis, atomic layer deposition (ALD) has been developed as a tool to stabilize and reduce carbon deposition on supported nanoparticles. Here, we discuss use of high vacuum ALD to deposit alumina films on size-selected, sub-nanometer Pt/SiO2 model catalysts. Mass-selected Pt24 clusters were deposited on oxidized Si(100), to form model Pt24/SiO2 catalysts with particles shown to be just under 1 nm, with multilayer three dimensional structure. Alternating exposures to trimethylaluminum and water vapor in an ultra-high vacuum chamber were used to grow alumina on the samples without exposing them to air. The samples were probed in situ using X-ray photoelectron spectroscopy (XPS), low-energy ion scattering spectroscopy (ISS), and CO temperature-programmed desorption (TPD). Additional samples were prepared for ex situ experiments using grazing incidence small angle x-ray scattering spectroscopy (GISAXS). Alumina growth is found to initiate at least 60 times more efficiently at the Pt24 cluster sites, compared to bare SiO2/Si, with a single ALD cycle depositing a full alumina layer on top of the clusters, with substantial additional alumina growth initiating on SiO2 sites surrounding the clusters. As a result, the clusters were completely passivated, with no exposed Pt binding sites.


Air Force Office of Scientific Research FA9550-19-1-0261


Email Address of Submitting Author


University of Utah


United States

ORCID For Submitting Author


Declaration of Conflict of Interest

No conflicts of interest

Version Notes

final submitted version