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Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O2 as a Molecular Probe

preprint
submitted on 16.10.2019, 18:13 and posted on 23.10.2019, 19:42 by Seryio Saris, Sanduni Dona, Valerie Niemann, Anna Loiudice, Raffaella Buonsanti
Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.

Funding

This work is financially supported by the Swiss National Science Foundation (AP Energy Grant, project number PYAPP2_166897/1). Valerie Niemann acknowledges support from the Fullbright U.S. Student program and Swiss Federal Commission for Scholarships for Foreign Students.

History

Email Address of Submitting Author

raffaella.buonsanti@epfl.ch

Institution

EPFL

Country

Switzerland

ORCID For Submitting Author

0000-0002-6592-1869

Declaration of Conflict of Interest

no conflic of interest

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