Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O2 as a Molecular Probe

Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.