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submitted on 08.05.2020 and posted on 11.05.2020by Tao Wei, Malte Kohring, Heiko B. Weber, Frank Hauke, Andreas Hirsch
In the present work, we developed
for the first time a practical approach to achieve multiply pattterning of graphene in a way of “molecular
graphene embroidery” (as analogy to the well-known fabric embroidery existing
in macroscopic world) by manipulating the graphene chemistry to generate
regular multiply functionalized patterns consisting of concentric regions of
covalent addend binding. Molecular graphene embroidery towards these spatially
resolved 2D-hetero-architectures was accomplished by repetitive electron-beam
lithography (EBL)/reduction/covalent-binding sequences starting with polymethyl
methacrylate (PMMA) covered graphene deposited on a reactive SiO2/Si
substrate, a key factor for strain-free antaratopic additions.