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Dynamic Perturbation of the Electrical Double Layer with an Electrochemical AFM for Confined Metal Electrodeposition

preprint
submitted on 09.06.2019 and posted on 11.06.2019 by Esther Alarcon, mark aarts
We demonstrate the directed electrochemical deposition of copper nanostructures by using an oscillating nanoelectrode operated with an atomic force microscope (AFM). Strikingly, the writing is only possible in highly dilute electrolytes and for a particular combination of AFM and electrochemical parameters. We propose a mechanism based on cyclic charging and discharging of the electrical double layer (EDL). The extended screening length and slower charge dynamics in dilute electrolytes allows the nanoelectrode to operate inside, and disturb, the EDL even for large oscillation amplitudes (~100 nm). Our unique approach can not only be used for controlled additive nano-fabrication but also provides insights into ion behavior and EDL dynamics at the solid-liquid interface.

Funding

This work is part of the research program at the Netherlands Organisation for Scienti c Research (NWO).

History

Email Address of Submitting Author

e.alarconllado@amolf.nl

Institution

AMOLF

Country

Netherlands

ORCID For Submitting Author

0000-0001-7317-9863

Declaration of Conflict of Interest

None

Licence

Exports