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Controlling Thermal Stability and Volatility of Organogold(I) Compounds for Vapor Deposition with Complementary Ligand Design

revised on 05.05.2019, 18:07 and posted on 06.05.2019, 16:34 by Matthew Griffiths, Zachary Dubrawski, Goran Bačić, Jason Masuda, Achini Japahuge, Tao Zeng, Sean Barry
We compare and contrast the volatility and thermal stability of a family of twelve organometallic gold(I) compounds using a combination of X-ray crystallography, thermogravimetric analysis (TGA), and density functional theory (DFT) techniques. Pentafluorophenyl is used as a new ligand for vapor deposition which produces rather low volatility, but very thermally stable compounds when combined with PMe3 and N,N'-di-tert-butylimidazolidin-2-ylidene. We introduce a precursor figure of merit that can be used to rank precursor usefulness. Using DFT, we find a linear correlation between Au-L bond strength and thermal stability, which demonstrates the power of computational techniques to predict successful synthetic targets for future precursor design studies.


Email Address of Submitting Author


Carleton University



ORCID For Submitting Author


Declaration of Conflict of Interest

No conflict of interest

Version Notes

Version 2. May 05, 2019