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Controlling Thermal Stability and Volatility of Organogold(I) Compounds for Vapor Deposition with Complementary Ligand Design

preprint
revised on 05.05.2019, 18:07 and posted on 06.05.2019, 16:34 by Matthew Griffiths, Zachary Dubrawski, Goran Bačić, Jason Masuda, Achini Japahuge, Tao Zeng, Sean Barry
We compare and contrast the volatility and thermal stability of a family of twelve organometallic gold(I) compounds using a combination of X-ray crystallography, thermogravimetric analysis (TGA), and density functional theory (DFT) techniques. Pentafluorophenyl is used as a new ligand for vapor deposition which produces rather low volatility, but very thermally stable compounds when combined with PMe3 and N,N'-di-tert-butylimidazolidin-2-ylidene. We introduce a precursor figure of merit that can be used to rank precursor usefulness. Using DFT, we find a linear correlation between Au-L bond strength and thermal stability, which demonstrates the power of computational techniques to predict successful synthetic targets for future precursor design studies.

History

Email Address of Submitting Author

matt.griffiths@carleton.ca

Institution

Carleton University

Country

Canada

ORCID For Submitting Author

0000-0002-3187-4064

Declaration of Conflict of Interest

No conflict of interest

Version Notes

Version 2. May 05, 2019

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