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An Integrated Cleanroom Process for the Vapor Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

preprint
submitted on 23.07.2019, 16:09 and posted on 24.07.2019, 12:10 by Alexander John Cruz, Ivo Stassen, Mikhail Krishtab, Kristof Marcoen, Timothée Stassin, Sabina Rodríguez-Hermida, Joan Teyssandier, Sven Pletincx, Rhea Verbeke, Víctor Rubio-Giménez, Sergio Tatay, Carlos Martí-Gastaldo, Johan Meersschaut, Philippe Vereecken, Steven De Feyter, Tom Hauffman, Rob Ameloot

Robust and scalable thin film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.

Funding

This project has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation program (grant agreement n° 716472, acronym: VAPORE and 714122, acronym: Chem-fs-MOF). The Research Foundation-Flanders (FWO) is acknowledged for funding in the research projects G083016N, 1529618N, 1501618N, and the infrastructure projects from the Hercules Foundation G0H0716N, ZW13_07 and AKUL/09/42 – HER/09/021.

History

Email Address of Submitting Author

alex.cruz@kuleuven.be

Institution

KU Leuven

Country

Belgium

ORCID For Submitting Author

0000-0002-5123-1162

Declaration of Conflict of Interest

The authors declare no competing financial interests.

Version Notes

submitted_version_01

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