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A Novel UV-C/XOH(X=Na or K) Based Highly Alkaline Advanced Oxidation Process (HA-AOP) for Degradation of Emerging Micropollutants

preprint
submitted on 11.01.2018 and posted on 12.01.2018 by Priyanshu Verma, Sujoy Kumar Samanta
Herein, a novel and comprehensible approach has been suggested to degrade the emerging micropollutants such as synthetic dyes. In this study, a continuous UV-C irradiation has been used to treat the aqueous matrix of synthetic pollutant dyes under highly alkaline environment (pH >13.0). In this HA-AOP, the treatment rate and degradation efficiency are primarily found to be affected by the type of pollutant dye present in the matrix, concentration of XOH or pH and UV-C fluence rate. In addition, the kinetic study indicates that HA-AOP or UV-C/XOH(X=Na or K) process follows zero order reaction kinetics during the degradation of parent pollutant species. The explored approach is quite auspicious due to its tremendous potential to handle versatile aqueous matrices containing natural organic materials, inorganic salts, fatty matters, surfactants and many more things. Overall, unlike other AOPs, this novel UV-C/XOH(X=Na or K) based HA-AOP could be highly utilized for the effective treatment of various alkaline wastewater streams.

History

Topic

  • Water Purification

Email Address of Submitting Author

priyanshuvermamickey@gmail.com

Email Address(es) for Other Author(s)

sksamanta@iitp.ac.in

Institution

Indian Institute of Technology Patna

Country

India

ORCID For Submitting Author

0000-0003-3699-1582

Declaration of Conflict of Interest

There are no conflicts to declare.

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